Induction devices and methods of using them

ABSTRACT

Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.

PRIORITY APPLICATION

This application is related to and claims priority to U.S. ProvisionalApplication No. 61/932,418 filed on Jan. 28, 2014, the entire disclosureof which is hereby incorporated herein by reference for all purposes.

TECHNOLOGICAL FIELD

This application is related to induction devices and methods of usingthem. More particularly, certain embodiments described herein aredirected to an induction device comprising one or more radial fins orprojections.

BACKGROUND

Induction devices are commonly used to sustain a plasma within a torchbody. A plasma includes charged particles. Plasmas may have many usesincluding atomizing and/or ionizing chemical species.

SUMMARY

In some aspects, a device for sustaining an ionization source in a torchcomprising a longitudinal axis along which a flow of gas is introducedduring operation of the torch, the device comprising a base configuredto provide a coil comprising an inner aperture constructed and arrangedto receive a body of the torch, and a radial fin coupled to the base, inwhich the device is configured to provide radio frequency energy to thebody of the torch to sustain the ionization source within the torch isdescribed. In certain embodiments, the radial fin is orientednon-parallel to the longitudinal axis of the torch and extends away fromthe aperture formed by the base. In other embodiments, the radial fin isorthogonal to the longitudinal axis of the torch. In some examples, theposition of the radial fin on the base is adjustable without decouplingthe radial fin from the base. In other examples, the radial fin couplesto the base through a fastener. In some instances, the radial fin isintegrally coupled to the base. In some configurations, the devicecomprises a plurality of radial fins coupled to the base. In otherconfigurations, at least two of the radial fins comprise the same angle.In some embodiments, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Infurther embodiments, at least two of the plurality of radial fins areangled at a different angle to the base when the base is not coiled. Insome instances, at least two of the plurality of radial fins have adifferent cross-sectional shape. In other examples, the radial fincomprises at least one aperture in the fin. In some examples, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the torch. In furtherembodiments, the fin aperture is angled toward the aperture formed bythe base. In some examples, the device comprises a plurality of radialfins coupled to the base, wherein at least two of the radial finscomprise an aperture in the fins, in which the apertures in the tworadial fins are constructed and arranged differently. In other examples,the radial fin is oriented non-parallel to the longitudinal axis of thetorch and extends inward within the aperture formed by the base. In someinstances, the radial fin is orthogonal to the longitudinal axis of thetorch. In further examples, the device comprises a plurality of radialfins coupled to the base, in which each of the plurality of radial finsis oriented non-parallel to the longitudinal axis of the torch and eachof the plurality of fins extends inward within the aperture formed bythe base. In some embodiments, the device comprises a plurality ofradial fins coupled to the base, in which each of the plurality ofradial fins is oriented non-parallel to the longitudinal axis of thetorch and at least one radial fin extends inward within the apertureformed by the base. In other examples, the device comprises a pluralityof radial fins coupled to the base, in which at least one radial fin ofthe plurality of radial fins extends away from the aperture formed bythe base and at least one radial fin of the plurality of radial finsextends inward within the aperture formed by the base. In some examples,the device comprises a spacer configured to engage adjacent radial finson adjacent turns of the base. In some embodiments, the spacer isconfigured to retain the adjacent fins in the same plane. In otherembodiments, the spacer is configured to retain the adjacent fins in adifferent plane.

In another aspect, a system for sustaining an ionization source, thesystem comprising a torch comprising a body comprising a longitudinalaxis along which a flow of gas is introduced during operation of thetorch, and a device comprising a base constructed and arranged as a coilcomprising an inner aperture configured to receive a portion of thetorch body, the device further comprising a radial fin coupled to thebase, in which the device is configured to provide radio frequencyenergy to the portion of the torch body received by the aperture tosustain the ionization source within the portion of the torch body isprovided.

In certain embodiments, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends away from the torch body inthe aperture. In other embodiments, the radial fin is orthogonal to thelongitudinal axis of the torch. In some examples, the position of theradial fin on the base is adjustable without decoupling the radial finfrom the base or removing the portion of the torch body within theaperture. In further examples, the radial fin couples to the basethrough a fastener. In some examples, the radial fin is integrallycoupled to the base. In other configurations, the system comprises aplurality of radial fins coupled to the base. In some examples, at leasttwo of the radial fins comprise the same angle. In other embodiments,each of the plurality of radial fins is angled at substantially the sameangle to the base when the base is not coiled. In further examples, atleast two of the plurality of radial fins are angled at a differentangle to the base when the base is not coiled. In some embodiments, atleast two of the plurality of radial fins have a differentcross-sectional shape. In certain examples, the radial fin comprises atleast one aperture in the fin. In some instances, the aperture isconfigured as a through hole that is positioned substantially parallelto the longitudinal axis of the torch. In certain configurations, thefin aperture is angled toward the aperture formed by the base. In otherconfigurations, the device comprises a plurality of radial fins coupledto the base, wherein at least two of the radial fins comprise anaperture in the fins, in which the apertures in the two radial fins areconstructed and arranged differently. In other configurations, theradial fin is oriented non-parallel to the longitudinal axis of thetorch and extends inward within the aperture formed by the base. In someembodiments, the radial fin is orthogonal to the longitudinal axis ofthe torch. In other examples, the system comprises a plurality of radialfins coupled to the base, in which each of the plurality of radial finsis oriented non-parallel to the longitudinal axis of the torch and eachof the plurality of fins extends inward within the aperture formed bythe base. In some examples, the system comprises a plurality of radialfins coupled to the base, in which each of the plurality of radial finsis oriented non-parallel to the longitudinal axis of the torch and atleast one radial fin extends inward within the aperture formed by thebase. In further embodiments, the system comprises a plurality of radialfins coupled to the base, in which at least one radial fin of theplurality of radial fins extends away from the aperture formed by thebase and at least one radial fin of the plurality of radial fins extendsinward within the aperture formed by the base. In additional examples,the system comprises an injector fluidically coupled to the torch andconfigured to provide sample to the ionization source sustained withinthe portion of the torch body. In further instances, the systemcomprises a radio frequency source electrically coupled to the device.In some configurations, the radio frequency source is configured toprovide radio frequencies of about 1 MHz to about 1000 MHz at a power ofabout 10 Watts to about 10,000 Watts. In other configurations, thesystem comprises a grounding plate electrically coupled to the base ofthe device. In some examples, the system comprises a detectorfluidically coupled to the torch and configured to receive sample fromthe torch. In further examples, the aperture formed by the basecomprises a substantially circular cross-sectional shape. In someconfigurations, the aperture formed by the base comprises asubstantially rectangular cross-sectional shape. In otherconfigurations, the aperture formed by the base comprises across-sectional shape other than a substantially circularcross-sectional shape or a substantially rectangular cross-sectionalshape. In certain embodiments, the system comprises a plurality ofradial fins coupled to the base, in which each of the plurality ofradial fins are sized and arranged to be the same. In some instances,the system comprises a plurality of radial fins coupled to the base, inwhich the radial fins are arranged on the base such that a larger numberof radial fins are present toward a proximal end of the base of thedevice. In some examples, the system comprises a spacer configured toengage adjacent radial fins on adjacent turns of the base. In someembodiments, the spacer is configured to retain the adjacent fins in thesame plane. In other embodiments, the spacer is configured to retain theadjacent fins in a different plane.

In an additional aspect, a mass spectrometer comprising a torchcomprising a body comprising a longitudinal axis along which a flow ofgas is introduced during operation of the torch;, a device comprising abase constructed and arranged as a coil comprising an inner apertureconfigured to receive a portion of the torch body, the device furthercomprising a radial fin coupled to the base, a radio frequency energysource electrically coupled to the device and configured to providepower to the device to sustain an ionization source within the portionof the torch body in the aperture of the base, and a mass analyzerfluidically coupled to the torch is disclosed.

In certain configurations, the radial fin is oriented non-parallel tothe longitudinal axis of the torch and extends away from the torch bodyin the aperture. In other configurations, the radial fin is orthogonalto the longitudinal axis of the torch. In some embodiments, the positionof the radial fin on the base is adjustable without decoupling theradial fin from the base or removing the portion of the torch bodywithin the aperture. In certain examples, the radial fin couples to thebase through a fastener. In other embodiments, the radial fin isintegrally coupled to the base. In some instances, the system comprisesa plurality of radial fins coupled to the base. In some embodiments, atleast two of the radial fins comprise the same angle. In otherembodiments, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Infurther embodiments, at least two of the plurality of radial fins areangled at a different angle to the base when the base is not coiled. Insome examples, at least two of the plurality of radial fins have adifferent cross-sectional shape. In other examples, the radial fincomprises at least one aperture in the fin. In some configurations, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the torch. In someexamples, the fin aperture is angled toward the aperture formed by thebase. In other examples, the device comprises a plurality of radial finscoupled to the base, wherein at least two of the radial fins comprise anaperture in the fins, in which the apertures in the two radial fins areconstructed and arranged differently. In some embodiments, the radialfin is oriented non-parallel to the longitudinal axis of the torch andextends inward within the aperture formed by the base. In otherembodiments, the radial fin is orthogonal to the longitudinal axis ofthe torch. In additional embodiments, the system comprises a pluralityof radial fins coupled to the base, in which each of the plurality ofradial fins is oriented non-parallel to the longitudinal axis of thetorch and each of the plurality of fins extends inward within theaperture formed by the base. In some examples, the system comprises aplurality of radial fins coupled to the base, in which each of theplurality of radial fins is oriented non-parallel to the longitudinalaxis of the torch and at least one radial fin extends inward within theaperture formed by the base. In other examples, the system comprises aplurality of radial fins coupled to the base, in which at least oneradial fin of the plurality of radial fins extends away from theaperture formed by the base and at least one radial fin of the pluralityof radial fins extends inward within the aperture formed by the base. Inadditional examples, the system comprises an injector fluidicallycoupled to the torch and configured to provide sample to the ionizationsource sustained within the portion of the torch body. In certainconfiguration, the system comprises a radio frequency sourceelectrically coupled to the device. In other configurations, the radiofrequency source is configured to provide radio frequencies of about 1MHz to about 1000 MHz at a power of about 10 Watts to about 10,000Watts. In some examples, the system comprises a grounding plateelectrically coupled to the base of the device. In other embodiments,the system comprises a detector fluidically coupled to the torch andconfigured to receive sample from the torch. In further instances, theaperture formed by the base comprises a substantially circularcross-sectional shape. In additional examples, the aperture formed bythe base comprises a substantially rectangular cross-sectional shape. Inother examples, the aperture formed by the base comprises across-sectional shape other than a substantially circularcross-sectional shape or a substantially rectangular cross-sectionalshape. In certain embodiments, the system comprises a plurality ofradial fins coupled to the base, in which each of the plurality ofradial fins are sized and arranged to be the same. In other embodiments,the system comprises a plurality of radial fins coupled to the base, inwhich the radial fins are arranged on the base such that a larger numberof radial fins are present toward a proximal end of the base of thedevice. In some examples, the system comprises a spacer configured toengage adjacent radial fins on adjacent turns of the base. In someembodiments, the spacer is configured to retain the adjacent fins in thesame plane. In other embodiments, the spacer is configured to retain theadjacent fins in a different plane.

In another aspect, a system for detecting optical emission, the systemcomprising a torch comprising a body comprising a longitudinal axisalong which a flow of gas is introduced during operation of the torch, adevice comprising a base constructed and arranged as a coil comprisingan inner aperture configured to receive a portion of the torch body, thedevice further comprising a radial fin coupled to the base, a radiofrequency energy source electrically coupled to the device andconfigured to provide power to the device to sustain an ionizationsource within the portion of the torch body in the aperture of the base,and an optical detector configured to detect optical emissions in thetorch is provided.

In certain embodiments, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends away from the torch body inthe aperture. In other embodiments, the radial fin is orthogonal to thelongitudinal axis of the torch. In some instances, the position of theradial fin on the base is adjustable without decoupling the radial finfrom the base or removing the portion of the torch body within theaperture. In certain configurations, the radial fin couples to the basethrough a fastener. In other configurations, the radial fin isintegrally coupled to the base. In further configurations, the systemcomprises a plurality of radial fins coupled to the base. In someexamples, at least two of the radial fins comprise the same angle. Inother instances, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Insome embodiments, at least two of the plurality of radial fins areangled at a different angle to the base when the base is not coiled. Insome configurations, at least two of the plurality of radial fins have adifferent cross-sectional shape. In other configurations, the radial fincomprises at least one aperture in the fin. In some embodiments, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the torch. In otherembodiments, the fin aperture is angled toward the aperture formed bythe base. In additional examples, the system comprises a plurality ofradial fins coupled to the base, wherein at least two of the radial finscomprise an aperture in the fins, in which the apertures in the tworadial fins are constructed and arranged differently. In some examples,the radial fin is oriented non-parallel to the longitudinal axis of thetorch and extends inward within the aperture formed by the base. Inother examples, the radial fin is orthogonal to the longitudinal axis ofthe torch. In some examples, the device comprises a plurality of radialfins coupled to the base, in which each of the plurality of radial finsis oriented non-parallel to the longitudinal axis of the torch and eachof the plurality of fins extends inward within the aperture formed bythe base. In other embodiments, the system comprises a plurality ofradial fins coupled to the base, in which each of the plurality ofradial fins is oriented non-parallel to the longitudinal axis of thetorch and at least one radial fin extends inward within the apertureformed by the base. In additional examples, the system comprises aplurality of radial fins coupled to the base, in which at least oneradial fin of the plurality of radial fins extends away from theaperture formed by the base and at least one radial fin of the pluralityof radial fins extends inward within the aperture formed by the base. Inother embodiments, the system comprises an injector fluidically coupledto the torch and configured to provide sample to the ionization sourcesustained within the portion of the torch body. In further examples, thesystem comprises a radio frequency source electrically coupled to thedevice. In other examples, the radio frequency source is configured toprovide radio frequencies of about 1 MHz to about 1000 MHz at a power ofabout 10 Watts to about 10,000 Watts. In some embodiments, the systemcomprises a grounding plate electrically coupled to the base of thedevice. In other embodiments, the system comprises a detectorfluidically coupled to the torch and configured to receive sample fromthe torch. In certain examples, the aperture formed by the basecomprises a substantially circular cross-sectional shape. In furtherembodiments, the aperture formed by the base comprises a substantiallyrectangular cross-sectional shape. In other embodiments, the apertureformed by the base comprises a cross-sectional shape other than asubstantially circular cross-sectional shape or a substantiallyrectangular cross-sectional shape. In some instances, the systemcomprises a plurality of radial fins coupled to the base, in which eachof the plurality of radial fins are sized and arranged to be the same.In other examples, the system comprises a plurality of radial finscoupled to the base, in which the radial fins are arranged on the basesuch that a larger number of radial fins are present toward a proximalend of the base of the device. In certain examples, the system comprisesa spacer configured to engage adjacent radial fins on adjacent turns ofthe base. In certain embodiments, the spacer is configured to retain theadjacent fins in the same plane. In other embodiments, the spacer isconfigured to retain the adjacent fins in a different plane.

In an additional aspect, a system for detecting atomic absorptionemission, the system comprising a torch comprising a body comprising alongitudinal axis along which a flow of gas is introduced duringoperation of the torch, a device comprising a base constructed andarranged as a coil comprising an inner aperture configured to receive aportion of the torch body, the device further comprising a radial fincoupled to the base, a radio frequency energy source electricallycoupled to the device and configured to provide power to the device tosustain an ionization source within the portion of the torch body in theaperture of the base, a light source configured to provide light to thetorch, and an optical detector configured to measure an amount of theprovided light transmitted through the torch is described.

In certain configurations, the radial fin is oriented non-parallel tothe longitudinal axis of the torch and extends away from the torch bodyin the aperture. In other configurations, the radial fin is orthogonalto the longitudinal axis of the torch. In some configurations, theposition of the radial fin on the base is adjustable without decouplingthe radial fin from the base or removing the portion of the torch bodywithin the aperture. In other configurations, the radial fin couples tothe base through a fastener. In further configurations, the radial finis integrally coupled to the base. In some embodiments, the systemcomprises a plurality of radial fins coupled to the base. In otherembodiments, at least two of the radial fins comprise the same angle. Insome examples, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Inother examples, at least two of the plurality of radial fins are angledat a different angle to the base when the base is not coiled. In someembodiments, at least two of the plurality of radial fins have adifferent cross-sectional shape. In other embodiments, the radial fincomprises at least one aperture in the fin. In further examples, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the torch. In someembodiments, the fin aperture is angled toward the aperture formed bythe base. In some examples, the device of the system further comprises aplurality of radial fins coupled to the base, wherein at least two ofthe radial fins comprise an aperture in the fins, in which the aperturesin the two radial fins are constructed and arranged differently. Incertain configurations, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends inward within the apertureformed by the base. In other configurations, the radial fin isorthogonal to the longitudinal axis of the torch. In certain examples,the system comprises a plurality of radial fins coupled to the base, inwhich each of the plurality of radial fins is oriented non-parallel tothe longitudinal axis of the torch and each of the plurality of finsextends inward within the aperture formed by the base. In some examples,the system comprises a plurality of radial fins coupled to the base, inwhich each of the plurality of radial fins is oriented non-parallel tothe longitudinal axis of the torch and at least one radial fin extendsinward within the aperture formed by the base. In other examples, thesystem comprises a plurality of radial fins coupled to the base, inwhich at least one radial fin of the plurality of radial fins extendsaway from the aperture formed by the base and at least one radial fin ofthe plurality of radial fins extends inward within the aperture formedby the base. In some embodiments, the system comprises an injectorfluidically coupled to the torch and configured to provide sample to theionization source sustained within the portion of the torch body. Inother embodiments, the system comprises a radio frequency sourceelectrically coupled to the device. In further instances, the radiofrequency source is configured to provide radio frequencies of about 1MHz to about 1000 MHz at a power of about 10 Watts to about 10,000Watts. In some configurations, the system comprises a grounding plateelectrically coupled to the base of the device. In other configurations,the system comprises a detector fluidically coupled to the torch andconfigured to receive sample from the torch. In certain embodiments, theaperture formed by the base comprises a substantially circularcross-sectional shape. In some examples, the aperture formed by the basecomprises a substantially rectangular cross-sectional shape. In certainexamples, the aperture formed by the base comprises a cross-sectionalshape other than a substantially circular cross-sectional shape or asubstantially rectangular cross-sectional shape. In some embodiments,the system comprises a plurality of radial fins coupled to the base, inwhich each of the plurality of radial fins are sized and arranged to bethe same. In other embodiments, the system comprises a plurality ofradial fins coupled to the base, in which the radial fins are arrangedon the base such that a larger number of radial fins are present towarda proximal end of the base of the device. In certain examples, thesystem comprises a spacer configured to engage adjacent radial fins onadjacent turns of the base. In certain embodiments, the spacer isconfigured to retain the adjacent fins in the same plane. In otherembodiments, the spacer is configured to retain the adjacent fins in adifferent plane.

In another aspect, a chemical reactor system comprising a reactionchamber, a device comprising a base constructed and arranged as a coilcomprising an inner aperture configured to receive a portion of thereaction chamber, the device further comprising a radial fin coupled tothe base, and a radio frequency energy source electrically coupled tothe device and configured to provide power to the device to sustain anionization source within the portion of the reaction chamber in theaperture of the base is provided.

In certain configurations, the radial fin is oriented non-parallel to alongitudinal axis of the reaction chamber and extends away from theaperture. In other configurations, the radial fin is orthogonal to thelongitudinal axis of the reaction chamber. In some embodiments, theposition of the radial fin on the base is adjustable without decouplingthe radial fin from the base or removing the portion of the reactionchamber within the aperture. In certain examples, the radial fin couplesto the base through a fastener. In other examples, the radial fin isintegrally coupled to the base. In additional examples, the systemcomprises a plurality of radial fins coupled to the base. In someembodiments, at least two of the radial fins comprise the same angle. Inother embodiments, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Incertain examples, at least two of the plurality of radial fins areangled at a different angle to the base when the base is not coiled. Infurther embodiments, at least two of the plurality of radial fins have adifferent cross-sectional shape. In some examples, the radial fincomprises at least one aperture in the fin. In other examples, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the reaction chamber.In some examples, the fin aperture is angled toward the aperture formedby the base. In further embodiments, the device of the system comprisesa plurality of radial fins coupled to the base, wherein at least two ofthe radial fins comprise an aperture in the fins, in which the aperturesin the two radial fins are constructed and arranged differently. In someinstances, the radial fin is oriented non-parallel to the longitudinalaxis of the reaction chamber and extends inward within the apertureformed by the base. In other instances, the radial fin is orthogonal tothe longitudinal axis of the reaction chamber. In further examples, thesystem comprises a plurality of radial fins coupled to the base, inwhich each of the plurality of radial fins is oriented non-parallel tothe longitudinal axis of the reaction chamber and each of the pluralityof fins extends inward within the aperture formed by the base. In someconfigurations, the system comprises a plurality of radial fins coupledto the base, in which each of the plurality of radial fins is orientednon-parallel to the longitudinal axis of the reaction chamber and atleast one radial fin extends inward within the aperture formed by thebase. In other configurations, the system comprises a plurality ofradial fins coupled to the base, in which at least one radial fin of theplurality of radial fins extends away from the aperture formed by thebase and at least one radial fin of the plurality of radial fins extendsinward within the aperture formed by the base. In certain embodiments,the system comprises an injector fluidically coupled to the reactionchamber and configured to provide a reactant to the ionization sourcesustained within the reaction chamber. In further examples, the systemcomprises a radio frequency source electrically coupled to the device.In some instances, the radio frequency source is configured to provideradio frequencies of about 1 MHz to about 1000 MHz at a power of about10 Watts to about 10,000 Watts. In certain embodiments, the systemcomprises a grounding plate electrically coupled to the base of thedevice. In other embodiments, the system comprises a detectorfluidically coupled to the reaction chamber and configured to receivereactant products from the reaction chamber. In some configurations, theaperture formed by the base comprises a substantially circularcross-sectional shape or a substantially rectangular cross-sectionalshape or a shape other than a substantially circular cross-sectionalshape or a substantially rectangular cross-sectional shape. In someembodiments, the system comprises a plurality of radial fins coupled tothe base, in which each of the plurality of radial fins are sized andarranged to be the same. In some arrangements, the system comprises aplurality of radial fins coupled to the base, in which the radial finsare arranged on the base such that a larger number of radial fins arepresent toward a proximal end of the base of the device. In certainexamples, the system comprises a spacer configured to engage adjacentradial fins on adjacent turns of the base. In certain embodiments, thespacer is configured to retain the adjacent fins in the same plane. Inother embodiments, the spacer is configured to retain the adjacent finsin a different plane.

In an additional aspect, a material deposition system comprising anatomization chamber, a device comprising a base constructed and arrangedas a coil comprising an inner aperture configured to receive a portionof the atomization chamber, the device further comprising a radial fincoupled to the base, a radio frequency energy source electricallycoupled to the device and configured to provide power to the device tosustain an ionization source within the portion of the atomizationchamber in the aperture of the base, and a nozzle fluidically coupled tothe atomization chamber and configured to receive atomized species fromthe chamber and provide the received, atomized species towards asubstrate is described.

In some configurations, the radial fin is oriented non-parallel to alongitudinal axis of the atomization chamber and extends away from theaperture. In other configurations, the radial fin is orthogonal to thelongitudinal axis of the atomization chamber. In further configurations,the position of the radial fin on the base is adjustable withoutdecoupling the radial fin from the base or removing the portion of theatomization chamber within the aperture. In some embodiments, the radialfin couples to the base through a fastener. In other embodiments, theradial fin is integrally coupled to the base. In further instances, thesystem comprises a plurality of radial fins coupled to the base. In someembodiments, at least two of the radial fins comprise the same angle. Inother examples, each of the plurality of radial fins is angled atsubstantially the same angle to the base when the base is not coiled. Infurther examples, at least two of the plurality of radial fins areangled at a different angle to the base when the base is not coiled. Insome embodiments, at least two of the plurality of radial fins have adifferent cross-sectional shape. In other embodiments, the radial fincomprises at least one aperture in the fin. In some instances, theaperture is configured as a through hole that is positionedsubstantially parallel to the longitudinal axis of the atomizationchamber. In additional examples, the fin aperture is angled toward theaperture formed by the base. In further embodiments, the devicecomprises a plurality of radial fins coupled to the base, wherein atleast two of the radial fins comprise an aperture in the fins, in whichthe apertures in the two radial fins are constructed and arrangeddifferently. In other examples, the radial fin is oriented non-parallelto the longitudinal axis of the atomization chamber and extends inwardwithin the aperture formed by the base. In certain examples, the radialfin is orthogonal to the longitudinal axis of the atomization chamber.In some embodiments, the system comprises a plurality of radial finscoupled to the base, in which each of the plurality of radial fins isoriented non-parallel to the longitudinal axis of the atomizationchamber and each of the plurality of fins extends inward within theaperture formed by the base. In other embodiments, the system comprisesa plurality of radial fins coupled to the base, in which each of theplurality of radial fins is oriented non-parallel to the longitudinalaxis of the atomization chamber and at least one radial fin extendsinward within the aperture formed by the base. In additionalembodiments, the system comprises a plurality of radial fins coupled tothe base, in which at least one radial fin of the plurality of radialfins extends away from the aperture formed by the base and at least oneradial fin of the plurality of radial fins extends inward within theaperture formed by the base. In other embodiments, the system comprisesan injector fluidically coupled to the atomization chamber andconfigured to provide a reactant to the ionization source sustainedwithin the atomization chamber. In further instances, the systemcomprises a radio frequency source electrically coupled to the device.In other examples, the radio frequency source is configured to provideradio frequencies of about 1 MHz to about 1000 MHz at a power of about10 Watts to about 10,000 Watts. In some configurations, the systemcomprises a grounding plate electrically coupled to the base of thedevice. In certain embodiments, the system comprises a detectorfluidically coupled to the atomization chamber and configured to receivereactant products from the atomization chamber. In further examples, theaperture formed by the base comprises a substantially circularcross-sectional shape or a substantially rectangular cross-sectionalshape or a cross-sectional shape other than a substantially circularcross-sectional shape or a substantially rectangular cross-sectionalshape. In some examples, the system comprises a plurality of radial finscoupled to the base, in which each of the plurality of radial fins aresized and arranged to be the same. In other embodiments, the systemcomprises a plurality of radial fins coupled to the base, in which theradial fins are arranged on the base such that a larger number of radialfins are present toward a proximal end of the base of the device. Incertain examples, the system comprises a spacer configured to engageadjacent radial fins on adjacent turns of the base. In certainembodiments, the spacer is configured to retain the adjacent fins in thesame plane. In other embodiments, the spacer is configured to retain theadjacent fins in a different plane.

In another aspect, a device for sustaining an ionization source in atorch comprising a longitudinal axis along which a flow of gas isintroduced during operation of the torch, the device comprising a plateelectrode comprising an inner aperture constructed and arranged toreceive a body of the torch, and a radial fin coupled to the plateelectrode, in which the plate electrode is configured to provide radiofrequency energy to the body of the torch to sustain the ionizationsource within the torch is described.

In some examples, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends away from the aperture of theplate electrode. In other examples, the radial fin is orthogonal to thelongitudinal axis of the torch. In certain embodiments, the position ofthe radial fin on the plate electrode is adjustable without decouplingthe radial fin from the plate electrode. In some configurations, theradial fin couples to the plate electrode through a fastener. In otherconfigurations, the radial fin is integrally coupled to the plateelectrode. In certain embodiments, the system comprises a plurality ofradial fins coupled to the plate electrode. In other embodiments, atleast two of the radial fins comprise the same angle. In some examples,each of the plurality of radial fins is angled at substantially the sameangle. In certain embodiments, at least two of the plurality of radialfins are angled at a different angle. In some examples, at least two ofthe plurality of radial fins have a different cross-sectional shape. Incertain embodiments, the radial fin comprises at least one aperture inthe fin. In some examples, the aperture is configured as a through holethat is positioned substantially parallel to the longitudinal axis ofthe torch. In other examples, the fin aperture is angled toward theaperture of the plate electrode. In some embodiments, the devicecomprises a plurality of radial fins coupled to the plate electrode,wherein at least two of the radial fins comprise an aperture in thefins, in which the apertures in the two radial fins are constructed andarranged differently. In other embodiments, the radial fin is orientednon-parallel to the longitudinal axis of the torch and extends inwardwithin the aperture of the plate electrode. In certain examples, theradial fin is orthogonal to the longitudinal axis of the torch. In otherembodiments, the system comprises a plurality of radial fins coupled tothe plate electrode, in which each of the plurality of radial fins isoriented non-parallel to the longitudinal axis of the torch and each ofthe plurality of fins extends inward within the aperture of the plateelectrode. In further examples, the system comprises a plurality ofradial fins coupled to the plate electrode, in which each of theplurality of radial fins is oriented non-parallel to the longitudinalaxis of the torch and at least one radial fin extends inward within theaperture of the plate electrode. In some examples, the system comprisesa second plate electrode comprising an inner aperture constructed andarranged to receive a body of the torch, and a radial fin coupled to thesecond plate electrode, in which the second plate electrode isconfigured to provide radio frequency energy to the body of the torch tosustain the ionization source within the torch. In certain examples, thesystem comprises a spacer configured to engage adjacent radial fins onadjacent turns of the base. In certain embodiments, the spacer isconfigured to retain the adjacent fins in the same plane. In otherembodiments, the spacer is configured to retain the adjacent fins in adifferent plane.

In an additional aspect, a system for sustaining an ionization source,the system comprising a torch comprising a body comprising alongitudinal axis along which a flow of gas is introduced duringoperation of the torch, and a plate electrode comprising an inneraperture constructed and arranged to receive a body of the torch and aradial fin coupled to the plate electrode, in which the plate electrodeis configured to provide radio frequency energy to the body of the torchto sustain the ionization source within the torch is provided.

In certain examples, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends away from the torch body inthe aperture. In other examples, the radial fin is orthogonal to thelongitudinal axis of the torch. In additional examples, the position ofthe radial fin is adjustable without decoupling the radial fin from theplate electrode or removing the portion of the torch body within theaperture. In some examples, the radial fin couples to the plateelectrode through a fastener. In other examples, the radial fin isintegrally coupled to the plate electrode. In further embodiments, thesystem comprises a plurality of radial fins coupled to the plateelectrode. In other embodiments, at least two of the radial finscomprise the same angle. In some instances, each of the plurality ofradial fins is angled at substantially the same angle. In otherexamples, at least two of the plurality of radial fins are angled at adifferent angle to the base. In further embodiments, at least two of theplurality of radial fins have a different cross-sectional shape. In someexamples, the radial fin comprises at least one aperture in the fin. Incertain configurations, the aperture is configured as a through holethat is positioned substantially parallel to the longitudinal axis ofthe torch. In other configurations, the fin aperture is angled towardthe aperture. In some embodiments, the system comprises a plurality ofradial fins coupled to the plate electrode, wherein at least two of theradial fins comprise an aperture in the fins, in which the apertures inthe two radial fins are constructed and arranged differently. In otherconfigurations, the radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends inward within the aperture ofthe plate electrode. In additional configurations, the radial fin isorthogonal to the longitudinal axis of the torch. In some embodiments,the system comprises a plurality of radial fins coupled to the plateelectrode, in which each of the plurality of radial fins is orientednon-parallel to the longitudinal axis of the torch and each of theplurality of fins extends inward within the aperture of the plateelectrode. In other embodiments, the system comprises a plurality ofradial fins coupled to the plate electrode, in which each of theplurality of radial fins is oriented non-parallel to the longitudinalaxis of the torch and at least one radial fin extends inward within theaperture formed by the base. In additional embodiments, the systemcomprises a plurality of radial fins coupled to the plate electrode, inwhich at least one radial fin of the plurality of radial fins extendsaway from the aperture of the plate electrode and at least one radialfin of the plurality of radial fins extends inward within the apertureof the plate electrode. In some instances, the system comprises aninjector fluidically coupled to the torch and configured to providesample to the ionization source sustained within the portion of thetorch body. In other configurations, the system comprises a radiofrequency source electrically coupled to the device. In someembodiments, the radio frequency source is configured to provide radiofrequencies of about 1 MHz to about 1000 MHz at a power of about 10Watts to about 10,000 Watts. In certain examples, the system comprises agrounding plate electrically coupled to the base of the device. In otherembodiments, the system comprises a detector fluidically coupled to thetorch and configured to receive sample from the torch. In certaininstances, the aperture of the plate electrode comprises a substantiallycircular cross-sectional shape or a substantially rectangularcross-sectional shape. In other instances, the aperture of the plateelectrode comprises a cross-sectional shape other than a substantiallycircular cross-sectional shape or a substantially rectangularcross-sectional shape. In some embodiments, the system comprises, aplurality of radial fins coupled to the plate electrode, in which eachof the plurality of radial fins are sized and arranged to be the same.In some configurations, the system comprises a plurality of radial finscoupled to the plate electrode, in which the radial fins are arranged onthe plate electrode such that a larger number of radial fins are presenton one side of the aperture. In other embodiments, the system comprisesa second plate electrode comprising an inner aperture constructed andarranged to receive a body of the torch, and a radial fin coupled to thesecond plate electrode, in which the second plate electrode isconfigured to provide radio frequency energy to the body of the torch tosustain the ionization source within the torch. In some examples, thesystem comprises a spacer configured to engage adjacent radial fins onadjacent turns of the base. In some embodiments, the spacer isconfigured to retain the adjacent fins in the same plane. In otherembodiments, the spacer is configured to retain the adjacent fins in adifferent plane.

Additional features, aspects, examples and embodiments are described inmore detail below.

BRIEF DESCRIPTION OF THE DRAWINGS

Certain embodiments of the devices and systems are described withreference to the accompanying figures in which:

FIG. 1 is a simplified illustration of a side view of an inductiondevice, in accordance with certain embodiments;

FIGS. 2A-2C show induction devices with fins positioned at differentangles, in accordance with certain configurations;

FIGS. 3A-3E show induction devices which include a through hole oraperture in a fin, in accordance with certain configurations;

FIG. 4 shows an induction device comprising a plurality of fins, inaccordance with certain configurations;

FIG. 5 shows an induction device comprising a plurality of fins andwhere the induction device has been coiled, in accordance with certainconfigurations;

FIGS. 6A-6C shows side views of induction devices where the fin spacingalong the length of the induction device has been varied, in accordancewith certain configurations;

FIG. 7 shows a side view of an induction device having differentlyshaped fins, in accordance with certain configurations;

FIGS. 8A and 8B shows side views of an induction device having differentlength fins, in accordance with certain configurations;

FIG. 9 shows a side view of an induction device having different widthfins, in accordance with certain configurations;

FIG. 10 shows an induction device with different fin-to-fin lateralspacing, in accordance with certain configurations;

FIGS. 11A and 11B are illustrations of induction devices with finsoriented at different angles, in accordance with certain configurations;

FIGS. 12A and 12B are photographs of an induction device that has beencoiled, in accordance with certain configurations;

FIGS. 13A and 13B are illustrations of coiled induction devices wherethe fin angle differs, in accordance with certain configurations;

FIGS. 14A and 14B are illustrations of a plate electrode comprising aplurality of fins, in accordance with certain configurations;

FIGS. 15A and 15B are side views of plate electrodes showing differentorientations of fins, in accordance with certain configurations;

FIG. 16 is an illustration of a finned induction device surrounding atorch, in accordance with certain configurations;

FIG. 17 is an illustration of finned plate electrodes surrounding atorch, in accordance with certain configurations;

FIG. 18 is an illustration of a finned plate electrode comprising acooling aperture in the base, in accordance with certain examples;

FIG. 19 is a block diagram of an optical emission spectrometer, inaccordance with certain configurations;

FIG. 20 is a block diagram of a single beam atomic absorptionspectrometer, in accordance with certain configurations;

FIG. 21 is a block diagram of a dual beam atomic absorptionspectrometer, in accordance with certain configurations;

FIG. 22 is a block diagram of a mass spectrometer, in accordance withcertain configurations;

FIGS. 23A-23C show various induction devices that can be coupled to eachother, in accordance with certain examples;

FIGS. 24A-24D are top view illustrations of couplers that can be used tofix the position of adjacent radial fins on adjacent radial coils, inaccordance with certain configurations;

FIG. 25 is a top view illustration of a coupler than can be used to fixthe position of radial fins on adjacent radial coils at an offset, inaccordance with certain examples;

FIGS. 26A-26D are top view illustrations of spacer blocks that can beused and/or joined to each other to provide a desired spacing betweencoils of an induction device, in accordance with certain embodiments;

FIG. 27A shows a photograph of a finned, copper induction device andFIG. 27B shows a photograph of a finned, aluminum alloy inductiondevice, in accordance with certain configurations;

FIG. 28A shows a plasma sustained using the finned, aluminum alloyinduction device and FIG. 28B shows a plasma sustained using a copperhelical induction coil, in accordance with certain configurations;

FIG. 29 is a table showing various measurements using a finned inductiondevice and a helical load coil, in accordance with certainconfigurations;

FIG. 30A is a photograph showing a finned induction device and torchafter 1 hour of continuous use and FIG. 30B is a photograph showing thesame finned induction and torch after 5 hours of continuous use, inaccordance with certain configurations; and

FIG. 31 is a graph showing the signal intensity of various metal speciesover time (in seconds), in accordance with certain configurations.

It will be recognized by the person of ordinary skill in the art, giventhe benefit of this disclosure, that certain dimensions or features ofthe components of the systems may have been enlarged, distorted or shownin an otherwise unconventional or non-proportional manner to provide amore user friendly version of the figures. In addition, the exactlength, width, geometry, aperture size, etc. of the induction device,the plasmas generated and other components herein may vary.

DETAILED DESCRIPTION

Certain embodiments are described below with reference to singular andplural terms in order to provide a user friendly description of thetechnology disclosed herein. These terms are used for conveniencepurposes only and are not intended to limit the devices, methods andsystems described herein. Certain examples are described herein withreference to induction devices. While the exact parameters used to powerthe induction devices may vary, the induction device can be electricallycoupled to an RF generator that provides radio frequencies, for example,from 10 MHz to 90 MHz, more particularly between 20 MHz and 50 MHz, forexample about 40 MHz. The RF generator output power is typically about500 Watts to 50 kW. Two or more induction devices may be present witheach induction device electrically coupled to a common RF generator orelectrically coupled to separate RF generators.

In some embodiments, the RF generator used with the induction devicesdescribed herein may be a hybrid generator as described in commonlyowned U.S. Provisional Application No. 61/894,560 filed on Oct. 23,2013, the entire disclosure of which is hereby incorporated herein byreference for all purposes. The induction devices can be used in manydifferent instruments and devices including, but not limited to, ICP-OESor ICP-MS or other similar instruments as described herein. In certainembodiments, generator operation can be controlled with a processor ormaster controller in or electrically coupled to the generator to controlthe generator, e.g., to enable or terminate the plasma generation.Certain embodiments are also described below that use an inductiondevice to generate and/or sustain an inductively coupled plasma. Ifdesired, however, the same induction device can be used (either alone orwith another device) to generate and/or sustain a capacitively coupledplasma, a flame or other atomization/ionization devices that can beused, for example, to atomize and/or ionize chemical species. Certainconfigurations are provided below using inductively coupled plasmas toillustrate various aspects and attributes of the technology describedherein. The radial fins described can extend inward toward a torchwithin an induction device comprising the radial fins, can extendoutward away from a torch within an induction device comprising theradial fins, or certain fins may extend inward and other fins may extendoutward.

In certain examples, the induction devices described herein can be usedto sustain a high-energy plasma to atomize and/or ionize samples forchemical analysis, to provide ions for deposition or other uses. Toignite and sustain the plasma, RF power, typically in the range of 0.5kW to 100 kW, from a RF generator (RFG) is inductively coupled to theplasma through the induction device. Referring to FIG. 1, an inductiondevice 100 is shown in an uncoiled or extended form for illustration.The device 100 comprises a base 110 that includes a generally solid orhollow body shown being positioned along a longitudinal axis L forspatial reference. The base 110 may be sized and arranged to be flexibleenough to permit coiling of the base to form an inner aperture that canreceive a portion of a torch body as noted in more detail below. Thebase 110 is electrically coupled to a radial fin 120 which extends (whenthe induction device 100 is in the extended form) generally outward in anon-parallel direction to the longitudinal axis L of the coiledinduction device. The exact angle present between the fin 120 and thebase 110 may vary from greater than 0 degrees to less than 180 degrees,more particularly, the angle between the base 110 and the fin 120 mayvary from about 30 degrees to about 150 degrees, e.g., about 45 degreesto about 135 degrees or about 60 degrees to about 120 degrees or about75 degrees to about 105 degrees or about 85 degrees to about 95 degrees.In some embodiments, the fin 120 is orthogonal to the base 110 when theinduction device 100 is in an extended form. Referring to FIGS. 2A-2C,in some configurations a fin 220 may be acutely angled (FIG. 2A)relative to a base 210 such that the angle between the fin 220 and thebase 210 is between 0 and 90 degrees. Alternatively, a fin 240 may beorthogonal to a base 230 as shown in FIG. 2B. A fin 260 may also beobtusely angled, e.g., between 90 degrees and 180 degrees, relative to abase 250 (FIG. 2C).

Referring again to FIG. 1, the position of the fin 120 along the base110 may vary. For example, the fin 120 may be positioned closer to anend 112 of the base 110 than to an end 114 of the base 110. The fin 120may be integrally coupled to the base 110 such that a generally solidunitary structure is present, or the fin 120 may be coupled to the base110 through an adhesive, weld, solder joint, screw, pin or other meansas described herein. In some embodiments, the base 110 may be configuredto permit location and/or relocation of the fin 120. For example, thebase 110 may be configured with a plurality of positions, e.g., slots orholes, each of which is configured to couple to the fin 120 through asuitable coupler, e.g., screw, pin, etc. The fin 120 can be located at adesired position along the base 110 and coupled to the base 110, for atleast some period, through the coupler. Similarly, the base 110 may beconfigured to permit adjustment of the angle of the fin 120 relative tothe base 110. In some instances, one or more conductive spacers may beplaced between the fin 120 and the base 110 to adjust the angle betweenthe base 110 and the fin 120. For example, a conductive wedge can beplaced between the base 110 and the fin 120 prior to coupling to alterthe angle between the base 110 and the fin 120. In some instances, thebase 110 may comprise an internal track designed to receive the fin 120.For example, the internal track may include a groove that is sized andarranged to receive the fin 120 such that the fin 120 can engage thetrack and slide down the track to a desired position. Once positioned ata desired site along the base 110, the fin 120 may be coupled using asuitable coupler. Alternatively, the size and dimensions of the trackmay be selected to provide a tight friction fit such that engagement ofthe fin by the track permits movement of the fin using a suitable forcebut does not generally permit the fin to fall out under the force ofgravity.

In certain examples, the fin may include one or more through-holes orapertures. Referring to FIGS. 3A and 3B, a simplified illustration of aninduction device comprising a fin with an aperture is shown. Theinduction device 300 comprises a base 310 electrically coupled to a fin320. The fin 320 comprises an aperture or through hole 330 thatgenerally provides an opening from one side of the fin 320 to the otherside of the fin 320 (see FIG. 3B). If desired, the fin 320 may includemore than a single aperture 330, e.g., may include two, three, four ormore apertures. While not wishing to be bound by any particularscientific theory, the aperture 330 of the fin may permit a cooling gasor fluid to enter and pass through the fin 320 to assist in cooling ofthe induction device 300. The angle of the aperture can vary. Referringto FIG. 3B, the aperture 330 has a zero angle such that the position ofthe entrance and exit are generally in the same x-y plane. If desired,however, the aperture may be angled. For example and referring to FIG.3C, a fin 340 comprises an aperture 350 that is angled downward suchthat the exit of the aperture 350 is positioned lower along the fin 340than the entrance of the aperture 350. Referring to FIG. 3D, a fin 360comprises an upwardly angled aperture 370 such that the entrance of theaperture 370 is positioned lower along the fin 360 than the exit of theaperture 370. In some instances, the entrance and exit of the aperturemay be positioned similarly, and the internal channel or pathway formedby the aperture may be curved or angled. For example and referring toFIG. 3E, an aperture 390 in a fin 380 is shown where the exit andentrance apertures are positioned at about the same location along thebody of the fin 380. The internal geometry of the aperture 390 anglesupward and then downward from entrance to exit. It may be desirable toadopt different internal geometries within the fin to slow the flow ofgas through the fins to increase the time and/or surface area availableto transfer heat from the fin to the gas. If desired, the geometryand/or size of the channel may be selected to provide an audibleindication that cooling gas is flowing through the aperture and/ordevice. For example, passage of gas through the apertures may provide anoise or “whistling” effect and provide an audible cue that theinduction device is being properly cooled.

In certain embodiments, the induction devices described herein maycomprise a base structure coupled to a plurality of fins. Referring toFIG. 4, an induction device 400 is shown in an extended form thatcomprises a base 410 electrically coupled to a plurality of fins(grouped as element 420). The fins 420 are generally sized and arrangedto be the same and are spaced about the same distance from each other.While nine fins are shown in the induction device 400, fewer than ninefins, e.g., 2, 3, 4, 5, 6, 7 or 8 fins may be present, or more than ninefins may be present. Where a plurality of fins are present, the fins canpermit a cooling gas to flow around them to provide forced-air orconvection cooling. The fins permit such cooling while reducing thelikelihood of eddy currents that may oppose the magnetic field providedby the induction device. The fins provide an increase in surface areawhile still permitting a cooling gas to flow on or around the inductiondevice. For example and referring to FIG. 5, one turn of an inductiondevice 500 is shown in a coiled form. The induction device 500 comprisesa base structure 510 and a plurality of radial fins 521-531. Whencoiled, the base 510 provides a central aperture 515 that is sized andarranged to receive a torch (not shown), as described in more detailbelow. The base 510 wraps around the torch so that the longitudinal axisof the torch is nearly orthogonal to the direction of the fins 521-531.The fins 521-531 extend radially away from the longitudinal axis of thetorch. Together, the base 510 and the fins 521-531 can provide RF energyinto the torch to sustain a plasma within the torch. The fin-to-finspacing of the fins 521-531 can be selected to permit cooling around theinduction device 500 while still maintaining a suitable magnetic fieldto provide energy into the torch to sustain the plasma. In someembodiments, the base 510 and the fins 521-531 may be hollow such that acooling gas can be introduced internally within the induction device500, whereas in other examples, the base 510 and/or fins 521-531 may besolid such that cooling gas is provided only to external surfaces of theinduction device 500.

In some embodiments, the spacing of the fins along the length of thebase may differ. For example and referring to FIG. 6A, an inductiondevice 600 is shown that comprises a base 605 electrically coupled tofins 610-618. More fins are located toward a proximal end 606 thanlocated at a distal end 607. Referring to FIG. 6B, an induction device630 is shown that comprises a base 635 electrically coupled to fins640-648. More fins are located toward a distal end 637 than a proximalend 636. Referring to FIG. 6C, an induction device 660 is shown thatcomprises a base 665 electrically coupled to fins 670-679. More fins arelocated toward the proximal end 666 and the distal end 667 than in thecenter of the base 665. By positioning different numbers of fins atdifferent portions along the base of the induction device, it may bepossible to tune, control or provide different magnetic fields to thetorch at different portions of the torch. For example, by positioning aplurality of fins at each end of an induction device, the magnetic fieldprovided by the center of the induction device may differ from themagnetic fields provided at the ends of the induction device.

In certain configurations, the shape of all the fins need not be thesame shape. Referring to FIG. 7, an induction device 700 is shown thatcomprises a base 710 electrically coupled to a plurality of fins. Fins720 and 722 have a different shape than fins 721 and 723. In particular,the ends of fins 720 and 722 are more rounded than the sharp endspresent on fins 721 and 723. While not wishing to be bound by anyparticular theory, rounded ends may be more desirable to avoid creationof turbulent cooling gas flows around the induction device 700. In someexamples, all fins of the induction device may have substantially thesame shape. In other configurations, at least one fin present in theinduction device is shaped differently than another fin present in theinduction device. In some instances, two different shapes are presentfor the fins of the induction device. In other instances, three or moredifferent shapes are present for the fins of the induction device. Finswith a similar shape may be positioned adjacent to each other or may bespaced apart by one or more fins with a different shape.

In certain instances, the length of the fins may vary. Referring to FIG.8A, an induction device 800 is shown comprising a base 810 and fins820-823 where at least one of the fins has a length different fromanother fin. For example, fin 821 is shown as having a shorter lengththan fins 820, 822 and 823. It may be desirable to alter the length ofthe fins to provide increase air flow through the spaces between thefins. For example and referring to FIG. 8B, an induction device maycomprise a base 860 electrically coupled to fins 870-873 with everyother fin being sized similarly, e.g., fins 870 and 872 may be sizedsimilarly and fins 871 and 873 may be sized similarly. The exact lengthof any of the fins may vary from about 0.1 inches to about 10% of thefreespace signal quarter-wavelength (e.g., up to about 10 inches for 30MHz operation), more particularly, about 0.5 inches to about 4 inches.Where different length fins are present, the fin-to-fin lateral spacingbetween different length fins may be the same or may be different.

In other configurations, the width of the fins may vary from fin to fin.Referring to FIG. 9, an induction device 900 is shown that comprises abase 910 electrically coupled to a fins 920-922. The fin 921 is widerthan the fins 920 and 922. Depending on the position of the fins, it maybe desirable to increase the fin width for fins placed downstream of theigniter, or fins that are further away from the plasma may be wider asless air flow may be needed for sufficient cooling. The exact width ofany of the fins may vary from about 0.01 inches to about 5% of thefreespace signal quarter-wavelength (e.g., up to about 5 inches for 30MHz operation), more particularly, about 0.02 inches to about 1 inch.While not shown in the figures, both the length and the width of finsmay be different in a single induction device. For example, an inductiondevice may comprise fins of different lengths and widths if desired.

In certain examples, the fin-to-fin lateral spacing may be variablewithin the induction device. For ease of illustration, one embodiment isshown in FIG. 10 where the fins all have the same length and width, butas noted herein, fins of differing lengths and widths may also bepresent. The induction device 1000 comprises a base 1010 and fins1020-1024. The lateral spacing between fins 1020 and 1021 is shown asbeing smaller than the spacing between fins 1021 and 1022 or the spacingbetween fins 1023 and 1024. While the exact effect of varying fin-to-finspacing on the magnetic field may change depending on the currentsprovided to the induction device, by selecting suitable spacing betweenfins, it may be possible to provide better temperature control to extendthe lifetime of the induction device and/or any torch positioned withinthe induction device. In some examples, the spacing between fins mayvary from about 0.01 inches to about 5 inches, more particularly, about0.02 inches to about 1 inch.

In certain embodiments, one or more fins may be angled at a differentangle relative to other fins present in the induction device. Referringto FIG. 11A, one illustration of an induction device comprisingdifferently angled fins is shown. The induction device 1100 comprises abase 1110 electrically coupled to fins 1120-1125. Fins 1120 and 1122 areangled toward fin 1121, and fins 1123, 1125 are angled toward fin 1124.As the induction device 1110 is coiled, the exact angle of the finsrelative to each other can change. In another configuration (see FIG.11B), an induction device 1150 may comprise a base 1160 and fins1170-1175. Fins 1170 and 1172 are angled away from fin 1171, and fins1173 and 1175 are angled away from fin 1174. Similar to the inductiondevice 1100, as the induction device 1150 is coiled the exact anglebetween the various fins may change. If desired, an induction device maycomprise fins 1120-1122 and fins 1170-1172, for example. Otherconfigurations are also possible and will be recognized by the person ofordinary skill in the art, given the benefit of this disclosure.

In certain embodiments, photographs of a coiled induction device areshown in FIGS. 12A and 12B. The induction device 1210 is electricallycoupled to a mount or interface 1225 through interconnects or legs 1220,1230. For example, one end of the induction device 1210 is electricallycoupled to the leg 1220, and the other end of the induction device 1210is electrically coupled to the leg 1230. Current of opposite polaritycan be provided to each of the legs 1220, 1230 or a current may beprovided to the induction device 1210 through the leg 1220 and the leg1230 can be connected to ground, for example. In some instances, one ofthe legs 1220, 1230 may be omitted, and the other end of the inductiondevice 1210 may be electrically coupled to ground. If desired, theinduction device, at some point between the legs 1220 and 1230, may beelectrically coupled to ground. As shown in FIG. 12B, coiling of theinduction device 1210 and attachment to the legs 1220, 1230 provides anaperture 1215 that may receive a torch. The aperture 1215 is generallysized and arranged to permit insertion of the torch into the aperture1215 without the torch surfaces touching the induction device 1210.Cooling gas may be provided to the induction device 1210 and can flowaround the fins and the base of the induction device 1210 to enhancethermal transfer and keep the induction device 1210 and/or torch fromdegrading due to excessive temperature.

In certain embodiments, the number of turns shown in the inductiondevice 1210 is about three. More particularly, there are about threetotal turns formed by coiling the base of the induction device 1210. Toincrease or decrease the number of turns, the overall length of the baseof the induction device can be altered with increased length permittingmore turns and decreased length permitting fewer turns. It may bedesirable, however, to use fewer turns than possible. For example, if aninduction device has a length suitable to permit about five turns, itmay be desirable to coil the device to include fewer than five turns.While not wishing to be bound by any particular theory, as the number ofturns increases, the length of the plasma can increase. In addition, thespacing between turns may be the same or may be different. For example,the spacing between a first turn and a second turn may differ from thespacing between a second turn and a third turn. Spacing can becontrolled, for example, by positioning the fins at desired positionsand/or by altering how tightly coiled the base is in the inductiondevice or can be adjusted using one or more of the spacers, e.g., finspacers, described herein.

In certain configurations, the fins present on the induction devicegenerally do not reduce the inductance of the load coil because eddycurrent cannot flow along the gaps between the fins. This permits anincrease in fin length to provide for better heat dissipation while atthe same time avoiding any increase in eddy currents. Mechanicalstresses can be distributed in the induction device, making it morestable when subject to heat. For example, between adjacent turns of theinduction device, there can be no localized connections that are subjectto higher mechanical stress, which may cause asymmetrical distortion ofthe induction device. While the induction device can be produced asseparate components that are coupled to each other using a weld, solder,adhesive or other materials, in some examples the induction device maybe fabricated using a single metal sheet, e.g., laser cut from a singlesheet of material such as, for example, 125 mil thick aluminum or coppersheets. The lack of welded or soldered joints can increase the long-termreliability for improved electrical connectivity.

In certain embodiments, the induction devices described herein may beused to sustain a low flow argon plasma. For example, the inductiondevice may permit an argon plasma gas flow of less than 15Liters/minute, more particularly less than 14, 13, 12, 11 or 10Liters/minute or, in certain instances, even less than 5 Liters/minuteof argon plasma gas. The power provided to the induction device may besimilar to that used with conventional helical induction coils, thoughit may be desirable to alter the electrical parameters to analyzecertain species and/or when using low flow conditions.

In certain embodiments, the base of the induction device may generallybe flat or small compared to the length of the fins, e.g., as shown inFIGS. 12A and 12B, to permit coiling of the induction device. In someinstances, one or more joints may be present in the base at desiredlocations to facilitate coiling of the induction device. The joints maytake many forms including, for example, ball and socket joints, hinges,or other suitable joints. The joints may be fixed in position once thebase is coiled to maintain the size of the aperture formed by coiling ofthe induction device. In other instances, individual induction devicesections may be coupled to each other to provide a desired number ofturns. For example, two or more induction devices each of which isconfigured to provide two turns may be coupled to each other to providean induction device with four turns. Additional induction devices may becoupled to each other to provide additional turns.

In certain examples, the exact geometry of the aperture formed bycoiling of the base of the induction device can vary. As shown in FIGS.12A and 12B, the aperture is generally circular and symmetrical. Ifdesired, however, the aperture may be asymmetrical or may take shapesother than circular, e.g., elliptical, ovoid, square, rectangular,triangular, pentagonal, hexagonal, etc. In addition, the aperture maynot be shaped the same along the length of the induction device. Forexample, the aperture formed by the first two turns may be circular andthe aperture formed by the third turn may be elliptical or take othershapes. By altering the shape of the aperture, the magnetic fieldprovided to the torch can be altered. In some instances, the shape ofthe aperture is generally selected to match the cross-sectional shape ofthe torch. Where the torch has a generally circular cross-sectionalshape, the cross-sectional shape of some portion of the aperture formedby the induction device may be circular as well.

In certain configurations, when the induction device is coiled theresulting fin angle may be the same or may be different for differentfins. In general, the fin angles will be different (with respect to thelongitudinal axis of a torch inserted through the aperture formed by thecoil) as the coiling results in different fin angles. For example, thecoiling of the base may result in a slight tilting of the fins such thatthe fins are positioned at a non-orthogonal angle to the longitudinalaxis of the torch. A side view of a single turn is shown in FIG. 13A. Afin 1322 is tilted toward the back face of a base 1310, and a fin 1320is tilted toward the front face of the base 1310. Referring to FIG. 13B,a fin 1370 is tilted toward a front face of a base 1360, and a fin 1372is tilted toward a back face of the base 1360. If desired, the fins maybe tilted towards the same face. The illustrations shown in FIGS. 13Aand 13B are provided for examples purposes only to demonstrate that oneor more fins electrically coupled to the coiled base may be tilted at adifferent angle than another fin that is electrically coupled to thecoiled base.

In some embodiments, the base of the induction device may be sized andarranged similar to that of a plate electrode. For example and referringto FIG. 14A, an induction device 1400 is shown that comprises a baseplate 1410 electrically coupled to a plurality of fins 1420-1436. Aninner aperture 1415 is present and is sized and arranged to receive atorch. A slot 1413 is present and splits the sides 1412 and 1414 of thebase plate 1410. Each of the sides 1412, 1414 may be electricallycoupled to a RF generator or other power source. The fins 1420-1436extend the size of the plate without increasing eddy currents that mayresult when larger plates are used. For example, the fins may be spacedapart a desired distance to permit a cooling gas to flow around the finsand at the same time can assist in providing a magnetic field (orelectric field or both) to the torch. While the outer cross-section ofthe base 1410 is shown as being generally rectangular, other shapes suchas circular, triangular, pentagonal, hexagonal, etc. may be presentinstead.

Another configuration of an electrode comprising a plurality of fins isshown in FIG. 14B. The electrode 1450 comprises a generally circularbase plate 1455, and a plurality of fins such as fins 1460, 1465, 1470,1475 and 1480 coupled to the base plate 1455. In the illustrativeconfiguration of FIG. 14B, each of the fins 1460-1480 may comprise aplurality of generally U-shaped members coupled to each other. In someinstances, the length of the arms of each U-shaped member can be thesame, whereas in other instances, different u-shaped members may havedifferent dimensions.

In certain configurations, the angle of fins present on base plates neednot be the same. Referring to FIG. 15A, a side view of an inductiondevice comprising a base plate electrically coupled to fins is shown.The base structure 1510 is shown as being a flat plate that iselectrically coupled to fins 1520-1525. Fins 1520-1523 are shown asprojecting out of the page, and fins 1524 and 1525 are angled toward thefront and back, respectively, of the base plate 1510. FIG. 15B showsanother configuration where the fins are positioned at different angles.A base plate 1550 is electrically coupled to fins 1560-1565. Fins 1560,1562 are angled toward a front of the base plate 1550, fins 1564 and1565 are angled toward the back of the base plate 1550 and fins 1561 and1563 are angled out of the page. The different fin angles can be used toalter the air flow around the induction device and/or alter the magneticfield provided to a torch within the induction device.

In certain examples, the induction devices described herein may be usedwith a torch configured to sustain an inductively coupled plasma withinthe torch. An embodiment showing a coiled induction device comprising aplurality of radial fins is shown in FIG. 16, where the majority of theradial fins have been omitted for clarity. In some embodiments, theinduction device may comprise a finned coil comprising a selected numberof turns, e.g., 3-10 turns. The finned coil provides RF energy into thetorch to sustain the plasma. For example, a torch 1614 and an coiledinduction device 1612 comprising radial fins 1612 a, 1612 b is shownthat would electrically couple to an RF generator. The fins 1612 a, 1612b are positioned radially in reference to the longitudinal axis of thetorch. The torch 1614 includes three generally concentric tubes 1614,1650, and 1648. The innermost tube 1648 provides atomized flow 1646 ofthe sample into the plasma 1616. The middle tube 1650 provides auxiliarygas flow 1644 to the plasma 1616. The outermost tube 1614 providescarrier gas flow 1628 for sustaining the plasma. The carrier gas flow1628 may be directed to the plasma 1616 in a laminar flow about themiddle tube 1650. The auxiliary gas flow 1644 may be directed to theplasma 1616 within the middle tube 1650 and the sample flow 1646 may bedirected to the plasma 1616 from a spray chamber (not shown) or othersample introduction device along the innermost tube 1648. RF currentprovided to the finned induction device 1612 from the generator may forma magnetic field within the induction device 1612 so as to confine theplasma 1616 therein. A plasma tail 1698 is shown that exits the torch1614. In certain examples, the plasma 1616 comprises a preheating zone1690, an induction zone 1692, an initial radiation zone 1694, ananalytic zone 1696 and a plasma tail 1698. The length of any of thesezones may be altered, for example, by adjusting the nature of theinduction device 1612. In operation of the induction device 1612, aplasma gas may be introduced into the torch 1614 and ignited. RF powerfrom the generator electrically coupled to the induction device 1612 maybe provided to sustain the plasma 1616 during ignition. In a typicalplasma, argon gas may be introduced into the torch at flow rates ofabout 15-20 Liters per minute, though as noted herein by using a finnedinduction device, the plasma gas can be reduced below 15 liters/minutesif desired. The plasma 1616 may be generated using a spark or an arc toignite the argon gas. The toroidal magnetic field from the inductiondevice 1612 causes argon atoms and ions to collide, which results in asuperheated environment, e.g., about 5,000-10,000 K or higher, thatforms the plasma 1616. While the induction device 1612 is shown in FIG.16 as including about three turns, it will be recognized by the personof ordinary skill in the art, given the benefit of this disclosure, thatfewer or more than three turns may be present in the induction device1612.

In some embodiments, one or more plate electrodes comprising fins may beelectrically coupled to a generator and used to sustain a plasma. Incertain examples, the planar nature of the plate electrodes permitsgeneration of a loop current in the torch body which is substantiallyperpendicular to the longitudinal axis of the torch body. The fins mayprovide for increased surface area to improve heat dissipation andpermit the plates to have larger dimensions than where fins are notpresent. The plate electrodes may be spaced symmetric from each otherwhere more than two plate electrodes are present, or the plateselectrodes may be asymmetrically spaced from each other, if desired. Anillustration of two plate electrodes each with radial fins is shown inFIG. 17. While a single radial fin is shown on electrodes 1752 a and1752 b, a plurality of fins, e.g., similar to that shown in FIG. 14, maybe present on each electrode 1752 a, 1752 b. The electrodes 1752 a, 1752b can be electrically coupled to a generator to permit operation of theplate electrodes. The induction device 1752 comprises two substantiallyparallel plates 1752 a, 1752 b positioned at a distance ‘L’ from oneanother. Each of the parallel plates 1752 a, 1752 b includes an aperture1754 through which the torch 1614 may be positioned such that the torch1614, the innermost tube 1648, the middle tube 1650 and the aperture1754 are aligned along a longitudinal axis 1726, which is generallyparallel to the longitudinal axis of the torch 1614. The exactdimensions and shapes of the aperture may vary and may be any suitabledimensions and shapes that can accept a torch. For example, the aperture1754 may be generally circular, may be square or rectangular shaped ormay have other shapes, e.g., may be triangular, oval, ovoid, or haveother suitable geometries. In certain examples, the aperture may besized such that it is about 0-50% or typically about 3% larger than theouter diameter of the torch 1614, whereas in other examples, the torch1614 may contact the plates 1752 a, 1752 b, e.g., some portion of thetorch may contact a surface of a plate, without any substantialoperational problems. The aperture 1754 of the induction device 1752 mayalso include a slot 1764 such that the aperture 1754 is in communicationwith its surroundings. Electrode 1752 a comprises a radial fin 1752 a 1,and electrode 1752 b comprises a radial fin 1752 b 1, though as notedabove a plurality of fins may be present on one or both of theelectrodes 1752 a, 1752 b. The fins 1752 a 1, 1752 b 1 are positionedradially with respect to the longitudinal axis 1726. In use of thefinned plates 1752 a, 1752 b, an RF generator is electrically coupled tothe plates 1752 a, 1752 b. RF current is supplied to the plates 1752 a,1752 b to provide a planar loop current, which generates a toroidalmagnetic field through the aperture 1754. Though two plate electrodes1752 a, 1752 b are shown in FIG. 17, a single finned plate electrode canbe used, three finned plate electrodes can be used or more than threefinned plate electrodes can be used. In addition, one plate electrodemay be finned and another plate electrode may have no fins. For example,plate electrodes upstream near an igniter may not have fins, and plateelectrodes downstream may be finned or vice versa. In some instances,one or more finless plate electrodes is sandwiched between two finnedplate electrodes. In other configurations, one finned plate electrode issandwiched between two finless plate electrodes. Other configurationsare possible and will be recognized by the person of ordinary skill inthe art, given the benefit of this disclosure.

In certain instances where plate electrodes are used, the plateelectrode may comprise one or more apertures or through-holes inaddition to the fins. For example and referring to FIG. 18, a plateelectrode is shown comprising a generally flat base 1810 and a pluralityof radial fins 1820-1836. Apertures or holes 1850-1853 are present inthe base 1810 to permit air to pass through the base 1810 and cool theelectrode. The size of the apertures 1850-1853 may vary but aredesirably small enough so that the field provided by the electrode isnot disrupted to a substantial degree. The number of apertures in thebase 1810 may vary from about one to about twenty, more particularlyabout two to about ten or other desired numbers of apertures may bepresent. The apertures can be positioned close to the edges of the base1810 or anywhere else along the surface of the base 1810. Whileapertures in a plate electrode are shown in FIG. 18, similar aperturescan be present in the base of an induction device designed to form aninduction coil, e.g., such as the induction device shown in FIGS. 12Aand 12B. If desired, one or all of the fins may be omitted or replacedwith the apertures such that a finless induction device with integralapertures can be used to sustain a plasma.

In certain examples, the induction devices described herein can be usedto sustain an inductively coupled plasma (ICP) that is present in anoptical emission system (OES). Illustrative components of an OES areshown in FIG. 19. The device 1900 includes a sample introduction system1930 fluidically coupled to a components used to provide an ICP 1940. Afinned induction device can be electrically coupled to a generator 1935and may be used to sustain the ICP 1940 in a torch. The generator 1935may be an RF generator such as, for example, a hybrid RF generator asdescribed in the commonly owned application incorporated herein byreference. The ICP 1940 is fluidically (or optically or both) coupled toa detector 1950. The sample introduction device 1930 may vary dependingon the nature of the sample. In certain examples, the sampleintroduction device 1930 may be a nebulizer that is configured toaerosolize liquid sample for introduction into the ICP 1940. In otherexamples, the sample introduction device 1930 may be configured todirectly inject sample into the ICP 1940. Other suitable devices andmethods for introducing samples will be readily selected by the personof ordinary skill in the art, given the benefit of this disclosure. Thedetector 1950 can take numerous forms and may be any suitable devicethat may detect optical emissions, such as optical emission 1955. Forexample, the detector 1950 may include suitable optics, such as lenses,mirrors, prisms, windows, band-pass filters, etc. The detector 1950 mayalso include gratings, such as echelle gratings, to provide amulti-channel OES device. Gratings such as echelle gratings may allowfor simultaneous detection of multiple emission wavelengths. Thegratings may be positioned within a monochromator or other suitabledevice for selection of one or more particular wavelengths to monitor.In certain examples, the detector 1950 may include a charge coupleddevice (CCD). In other examples, the OES device may be configured toimplement Fourier transforms to provide simultaneous detection ofmultiple emission wavelengths. The detector 1950 can be configured tomonitor emission wavelengths over a large wavelength range including,but not limited to, ultraviolet, visible, near and far infrared, etc.The OES device 1900 may further include suitable electronics such as amicroprocessor and/or computer and suitable circuitry to provide adesired signal and/or for data acquisition. Suitable additional devicesand circuitry are known in the art and may be found, for example, oncommercially available OES devices such as Optima 2100DV series, Optima5000 DV series and Optima 7000 series OES devices commercially availablefrom PerkinElmer Health Sciences, Inc. (Waltham, Mass.). The optionalamplifier 1960 may be operative to increase a signal 1955, e.g., amplifythe signal from detected photons, and can provide the signal to adisplay 1970, which may be a readout, computer, etc. In examples wherethe signal 1955 is sufficiently large for display or detection, theamplifier 1960 may be omitted. In certain examples, the amplifier 1960is a photomultiplier tube configured to receive signals from thedetector 1950. Other suitable devices for amplifying signals, however,will be selected by the person of ordinary skill in the art, given thebenefit of this disclosure. It will also be within the ability of theperson of ordinary skill in the art, given the benefit of thisdisclosure, to retrofit existing OES devices with the induction devicesdescribed herein and to design new OES devices using the inductiondevices disclosed herein. The OES device 1900 may further includeautosamplers, such as AS90 and AS93 autosamplers commercially availablefrom PerkinElmer Health Sciences or similar devices available from othersuppliers.

In certain embodiments, the induction devices described herein can beused in an instrument designed for absorption spectroscopy (AS). Atomsand ions may absorb certain wavelengths of light to provide energy for atransition from a lower energy level to a higher energy level. An atomor ion may contain multiple resonance lines resulting from transitionfrom a ground state to a higher energy level. The energy needed topromote such transitions may be supplied using numerous sources, e.g.,heat, flames, plasmas, arc, sparks, cathode ray lamps, lasers, etc., asdiscussed further below. In some examples, the induction devicesdescribed herein can be used to sustain an ICP to provide the energy orlight that is absorbed by the atoms or ions. In certain examples, asingle beam AS device is shown in FIG. 20. The single beam AS device2000 includes a power source 2010, a lamp 2020, a sample introductiondevice 2025, an ICP device 2030 electrically coupled to a generator2035, a detector 2040, an optional amplifier 2050 and a display 2060.The power source 2010 may be configured to supply power to the lamp2020, which provides one or more wavelengths of light 2022 forabsorption by atoms and ions. If desired, the power source 2010 may alsobe electrically coupled to the generator 2035. Suitable lamps include,but are not limited to mercury lamps, cathode ray lamps, lasers, etc.The lamp may be pulsed using suitable choppers or pulsed power supplies,or in examples where a laser is implemented, the laser may be pulsedwith a selected frequency, e.g. 5, 10, or 20 times/second. The exactconfiguration of the lamp 2020 may vary. For example, the lamp 2020 mayprovide light axially along the ICP 2030 or may provide light radiallyalong the ICP device 2030. The example shown in FIG. 20 is configuredfor axial supply of light from the lamp 2020. There can besignal-to-noise advantages using axial viewing of signals. The ICP 2030may be sustained using any of the induction devices described herein,e.g., finned induction devices, or other suitable induction devices andtorches that may be readily selected or designed by the person ofordinary skill in the art, given the benefit of this disclosure. Assample is atomized and/or ionized in the ICP 2030, the incident light2022 from the lamp 2020 may excite atoms. That is, some percentage ofthe light 2022 that is supplied by the lamp 2020 may be absorbed by theatoms and ions in the ICP 2030. The remaining percentage of the light2037 may be transmitted to the detector 2040. The detector 2040 mayprovide one or more suitable wavelengths using, for example, prisms,lenses, gratings and other suitable devices such as those discussedabove in reference to the OES devices, for example. The signal may beprovided to the optional amplifier 2050 for increasing the signalprovided to the display 2060. To account for the amount of absorption bysample in the ICP 2030, a blank, such as water, may be introduced priorto sample introduction to provide a 100% transmittance reference value.The amount of light transmitted once sample is introduced into the ICPor exits from the ICP may be measured, and the amount of lighttransmitted with sample may be divided by the reference value to obtainthe transmittance. The negative log_(in) of the transmittance is equalto the absorbance. The AS device 2000 may further include suitableelectronics such as a microprocessor and/or computer and suitablecircuitry to provide a desired signal and/or for data acquisition.Suitable additional devices and circuitry may be found, for example, oncommercially available AS devices such as AAnalyst series spectrometerscommercially available from PerkinElmer Health Sciences. It will also bewithin the ability of the person of ordinary skill in the art, given thebenefit of this disclosure, to retrofit existing AS devices with theinduction devices disclosed here and to design new AS devices using theinduction devices disclosed herein. The AS devices may further includeautosamplers known in the art, such as AS-90A, AS-90plus and AS-93plusautosamplers commercially available from PerkinElmer Health Sciences.

In certain embodiments and referring to FIG. 21, the induction devicesdescribed herein can be used in a dual beam AS device 2100 that includesa power source 2110, a lamp 2120, a ICP 2165, a generator 2166electrically coupled to an induction device of the ICP 2165, a detector2180, an optional amplifier 2190 and a display 2195. The power source2110 may be configured to supply power to the lamp 2120, which providesone or more wavelengths of light 2125 for absorption by atoms and ions.Suitable lamps include, but are not limited to, mercury lamps, cathoderay lamps, lasers, etc. The lamp may be pulsed using suitable choppersor pulsed power supplies, or in examples where a laser is implemented,the laser may be pulsed with a selected frequency, e.g. 5, 10 or 20times/second. The configuration of the lamp 2120 may vary. For example,the lamp 2120 may provide light axially along the ICP 2165 or mayprovide light radially along the ICP 2165. The example shown in FIG. 21is configured for axial supply of light from the lamp 2120. As discussedabove, there may be signal-to-noise advantages using axial viewing ofsignals. The ICP 2165 may be sustained using a generator and any of theinduction devices described herein or other similar induction devicesthat may be readily selected or designed by the person of ordinary skillin the art, given the benefit of this disclosure. As sample is atomizedand/or ionized in the ICP 2165, the incident light 2125 from the lamp2120 may excite atoms. That is, some percentage of the light 2125 thatis supplied by the lamp 2120 may be absorbed by the atoms and ions inthe ICP 2165. The remaining percentage of the light 2167 is transmittedto the detector 2180. In examples using dual beams, the incident light2125 may be split using a beam splitter 2130 such that some percentageof light, e.g., about 10% to about 90%, may be transmitted as a lightbeam 2135 to the ICP 2165 and the remaining percentage of the light maybe transmitted as a light beam 2140 to mirrors or lenses 2150 and 2155.The light beams may be recombined using a combiner 2170, such as ahalf-silvered mirror, and a combined signal 2175 may be provided to thedetection device 2180. The ratio between a reference value and the valuefor the sample may then be determined to calculate the absorbance of thesample. The detection device 2180 may provide one or more suitablewavelengths using, for example, prisms, lenses, gratings and othersuitable devices known in the art, such as those discussed above inreference to the OES devices, for example. Signal 2185 may be providedto the optional amplifier 2190 for increasing the signal to provide tothe display 2195. The AS device 2100 may further include suitableelectronics known in the art, such as a microprocessor and/or computerand suitable circuitry to provide a desired signal and/or for dataacquisition. Suitable additional devices and circuitry may be found, forexample, on commercially available AS devices such as AAnalyst seriesspectrometers commercially available from PerkinElmer Health Sciences,Inc. It will be within the ability of the person of ordinary skill inthe art, given the benefit of this disclosure, to retrofit existing dualbeam AS devices with the induction devices disclosed here and to designnew dual beam AS devices using the induction devices disclosed herein.The AS devices may further include autosamplers known in the art, suchas AS-90A, AS-90plus and AS-93plus autosamplers commercially availablefrom PerkinElmer Health Sciences, Inc.

In certain embodiments, the generators described herein can be used in amass spectrometer (MS). An illustrative MS device is shown in FIG. 22.The MS device 2200 includes a sample introduction device 2210, anionization device 2220 (labeled as ICP) electrically coupled to agenerator 2225, a mass analyzer 2230, a detection device 2240, aprocessing device 2250 and a display 2260. The sample introductiondevice 2210, ionization device 2220, the mass analyzer 2230 and thedetection device 2240 may be operated at reduced pressures using one ormore vacuum pumps. In certain examples, however, only the mass analyzer2230 and the detection device 2240 may be operated at reduced pressures.The sample introduction device 2210 may include an inlet systemconfigured to provide sample to the ionization device 2220. The inletsystem may include one or more batch inlets, direct probe inlets and/orchromatographic inlets. The sample introduction device 2210 may be aninjector, a nebulizer or other suitable devices that may deliver solid,liquid or gaseous samples to the ionization device 2220. The ionizationdevice 2220 may be an inductively coupled plasma generated and/orsustained using the generator 2225, e.g., using a finned inductiondevice electrically coupled to a hybrid RF generator or conventionalgenerator. If desired, the ionization device can be coupled to anotherionization device, e.g., another device which can atomize and/or ionizea sample including, for example, plasma (inductively coupled plasmas,capacitively coupled plasmas, microwave-induced plasmas, etc.), arcs,sparks, drift ion devices, devices that can ionize a sample usinggas-phase ionization (electron ionization, chemical ionization,desorption chemical ionization, negative-ion chemical ionization), fielddesorption devices, field ionization devices, fast atom bombardmentdevices, secondary ion mass spectrometry devices, electrosprayionization devices, probe electrospray ionization devices, sonic sprayionization devices, atmospheric pressure chemical ionization devices,atmospheric pressure photoionization devices, atmospheric pressure laserionization devices, matrix assisted laser desorption ionization devices,aerosol laser desorption ionization devices, surface-enhanced laserdesorption ionization devices, glow discharges, resonant ionization,thermal ionization, thermospray ionization, radioactive ionization,ion-attachment ionization, liquid metal ion devices, laser ablationelectrospray ionization, or combinations of any two or more of theseillustrative ionization devices. The mass analyzer 2230 may takenumerous forms depending generally on the sample nature, desiredresolution, etc., and exemplary mass analyzers can include one or morecollision cells, reaction cells or other components as desired. Thedetection device 2240 may be any suitable detection device that may beused with existing mass spectrometers, e.g., electron multipliers,Faraday cups, coated photographic plates, scintillation detectors, etc.,and other suitable devices that will be selected by the person ofordinary skill in the art, given the benefit of this disclosure. Theprocessing device 2250 typically includes a microprocessor and/orcomputer and suitable software for analysis of samples introduced intoMS device 2200. One or more databases may be accessed by the processingdevice 2250 for determination of the chemical identity of speciesintroduced into MS device 2200. Other suitable additional devices knownin the art may also be used with the MS device 2200 including, but notlimited to, autosamplers, such as AS-90plus and AS-93plus autosamplerscommercially available from PerkinElmer Health Sciences, Inc.

In certain embodiments, the mass analyzer 2230 of the MS device 2200 maytake numerous forms depending on the desired resolution and the natureof the introduced sample. In certain examples, the mass analyzer is ascanning mass analyzer, a magnetic sector analyzer (e.g., for use insingle and double-focusing MS devices), a quadrupole mass analyzer, anion trap analyzer (e.g., cyclotrons, quadrupole ions traps),time-of-flight analyzers (e.g., matrix-assisted laser desorbedionization time of flight analyzers), and other suitable mass analyzersthat may separate species with different mass-to-charge ratio. In someexamples, the MS devices disclosed herein may be hyphenated with one ormore other analytical techniques. For example, MS devices may behyphenated with devices for performing liquid chromatography, gaschromatography, capillary electrophoresis, and other suitable separationtechniques. When coupling an MS device with a gas chromatograph, it maybe desirable to include a suitable interface, e.g., traps, jetseparators, etc., to introduce sample into the MS device from the gaschromatograph. When coupling an MS device to a liquid chromatograph, itmay also be desirable to include a suitable interface to account for thedifferences in volume used in liquid chromatography and massspectroscopy. For example, split interfaces may be used so that only asmall amount of sample exiting the liquid chromatograph may beintroduced into the MS device. Sample exiting from the liquidchromatograph may also be deposited in suitable wires, cups or chambersfor transport to the ionization devices of the MS device. In certainexamples, the liquid chromatograph may include a thermospray configuredto vaporize and aerosolize sample as it passes through a heatedcapillary tube. Other suitable devices for introducing liquid samplesfrom a liquid chromatograph into a MS device will be readily selected bythe person of ordinary skill in the art, given the benefit of thisdisclosure. In certain examples, MS devices can be hyphenated with eachother for tandem mass spectroscopy analyses.

In certain embodiments, the systems and devices described herein mayinclude additional components as desired. For example, it may bedesirable to include a photosensor in an optical path of the plasma sothe system can detect when the plasma has been ignited.

In some examples, the induction devices described herein can be used innon-instrumental applications including, but not limited to, materialdeposition devices, vapor deposition devices, ion implantation devices,welding torches, molecular beam epitaxy devices or other devices orsystems that use an atomization and/or ionization source to provide adesired output, e.g., ions, atoms or heat, may be used with thegenerators described herein. Such systems can include similar inductiondevices as described herein, nozzles, assist gases and other componentsto facilitate deposition of species into a surface. In addition, theinduction devices described herein can be used in chemical reactors topromote formation of certain species at high temperature. For example,radioactive waste can be processed in a reaction chamber using devicesincluding the induction devices described herein.

In certain examples, the induction devices described herein may be usedin kit form and may include two or more individual induction deviceswhich can be coupled to each other to provide a single induction devicewith a desired number of turns. Referring to FIG. 23A, a first inductiondevice 2300 comprises a base 2305 and fins 2320-2322. A second inductiondevice 2350 comprises a base 2355 and fins 2360-2363 (see FIG. 23B). Theinduction devices 2300, 2350 may be packaged together in a kit. Whilethe number of fins of the induction devices 2300, 2350 are shown asbeing different, they may be the same if desired. The induction device2300 may include a coupler 2307 in the base 2305 and is configured toreceive a coupler 2357 on the base 2355. The two couplers 2307, 2357 canbe coupled to each other (see FIG. 23C) to provide an induction device2390 that comprise the components from both of the induction devices2305 and 2355. In some embodiments, a plurality of individual inductiondevices may be coupled to each other to provide an induction device witha desired length and/or a desired number of fins. Different inductiondevices may have different length fins, different angled fins, differentwidth fins or different fin-to-fin spacing to permit a user to assemblea functional induction device of a desired configuration. One or more ofthe fins may comprise through-holes or apertures as described herein. Insome configurations, the couplers of the induction devices can beconfigured to assist in bending or coiling of the base structure toprovide an inner aperture of a desired size and/or shape. For example,the couplers may form a joint which can articulate (at least to somedegree) to permit bending of the base of the induction device into adesired shape or configuration. The kit may comprise instructions forassembling the individual induction devices into a larger inductiondevice and/or for using the induction device to sustain a plasma orother ionization/atomization source.

In certain instances, adjacent fins on adjacent coil turns can be fixedin position using one or more removable spacers that engage the adjacentfins. Referring to FIG. 24A, an illustration of a spacer 2410 installedover adjacent fins 2402, 2404 on an induction device is shown. Inparticular, the spacer 2410 comprises a body 2410 and apertures 2412 and2414 than slide over the fins 2402, 2404, respectively. The spacer 2410acts to hold the adjacent fins 2402, 2404 in place in the coil. Inaddition, the length of the spacer can be used to adjust thecoil-to-coil spacing in the induction device. For example and referringto FIG. 24B, a two hole radial fin spacer 2410 is shown that slides overfins 2422, 2424. The apertures 2432, 2434 are spaced with a widerspacing in the body 2421 than the apertures 2402, 2404 in the body 2411.This wider spacing results in increased separation in the coil thatincludes the fin 2422 and the coil that includes the fin 2424. Ifdesired, a smaller spacing between apertures of a spacer can be presentto reduce the coil-to-coil spacing.

In some instances, a three hole spacer can be used to fix the spacingbetween adjacent fins. Referring to FIG. 24C, a three hole spacer 2440is shown that comprises a body 2441 and three apertures 2452, 2454 and2456. In FIG. 24C, adjacent radial fins 2442, 2444 have been insertedinto the apertures 2452 and 2456 and aperture 2454 remains open. Ifdesired, however, one of the fins could instead be inserted into theaperture 2454 and one of the other apertures 2452, 2456 could remainopen. For example, FIG. 24D shows a configuration where the aperture2452 remains open and fins 2442, 2444 are present in apertures 2454 and2456. The coil-to-coil spacing provided using the spacer configurationof FIG. 24D would be larger than the coil-to-coil spacing provided inthe configuration of FIG. 24C (assuming the same length for the body2441). While two and three hole spacers are shown in FIGS. 24A-24D, morethan three holes may be present in a spacer. For example, a spacer canbe configured to permit radial fins running along the entire inductiondevice to be engaged. Where the induction device comprises four turns, aspacer with four holes can be used. Where an induction device comprisesfive turns, a spacer with five holes can be used. In other instances,more than a single spacer can be used in an induction device. Forexample, two or more separate spacers can be positioned at differentareas.

In some configurations, the spacer may be used to fix the position ofadjacent radial fins in an offset position. For example and referring toFIG. 25, a top view of a spacer 2510 is shown that comprises two holesor apertures 2512, 2514 which are offset from each other. Radial fins2522, 2524 are engaged by the holes 2512, 2514 respectively. The offsetof the holes 2512, 2514 forces the radial fins 2522, 2524 to be offsetfrom each other. Coil-to-coil spacing is also fixed when the coupler2510 is engaged to the fins 2522, 2524.

In some instances, the spacers described herein may be present in blockform to permit an end user to couple two or more spacers together toprovide a desired spatial separation between adjacent coils. For exampleand referring to FIGS. 26A-26D, a one hole spacer block 2610 and a twohole spacer block 2620 can be coupled to each other to provide a threehole spacer block 2630. Alternatively, three of the on hole spacerblocks 2610 can be coupled to each other to provide a three hole spacerblock 2640. Each of the spacer blocks may include suitable features,e.g., similar to the features described for the devices of FIGS. 23A-23Cto permit coupling or joining of the spacer blocks to each other. Thespacers can be packaged together in a kit comprising one hole spacer,two holes spacers and/or three hole spacers, and an end user can couplea suitable number of spacers to provide a desired coil-to-coil spacing.

In certain embodiments, the spacers described herein, e.g., thoseillustrative ones shown in FIGS. 24A-26D, can be produced usingnon-conductive materials. For example, the body of the spacers can beproduced using one or more non-conductive plastics, alumina,polytetrafluoroethylene or other materials which can act as insulators.The exact number of spacers used and their configurations can vary. Insome embodiments, a spacer may comprise a similar number of apertures asthe number of coils present in the induction device. In other instances,two or more spacers each with fewer holes than the number of coils canbe used, e.g., 2 two hole spacers can be used in a three coil inductiondevice with the first spacer bridging the first and second coils and thesecond spacer bridging the second and third coils. Where two or morespacers are used, the spacer may be offset from each other a desirednumber of degrees, e.g., 45 degrees, 60 degrees, 90 degrees, 120degrees, 150 degrees, 180 degrees or any value in between theseillustrative values. If desired, three, four or more separate spacersmay also be used. In some instances, a one hole spacer may be engaged toadjacent radial fins to provide a desired coil-to-coil spacing withoutlocking the adjacent radial fins to each other, e.g., the one holespacer permits some flexibility in the coils.

Certain specific examples are described below to illustrate further someof the novel aspects, embodiments and features described herein.

EXAMPLE 1

Referring to FIGS. 27A and 27B, two photographs of coiled, finnedinduction devices are shown. Each induction device was produced frommetal sheet (125 mil thick copper for the induction device of FIG. 27Aand 125 mil thick aluminum 1100 alloy for the induction device of FIG.27B). The induction device is then bent into the coiled configurationshown. A penny is shown in each photograph for scale. The conductingpath has a (substantially) square cross section so that it can be benteasily in any direction. The current flows allow the flat surface of thesquare cross section to reduce/minimize current crowding.

EXAMPLE 2

The aluminum finned induction device of FIG. 27B was used to sustain aplasma. A 3-turn copper load coil from a NexION instrument was also usedfor comparison. The plasma produced using the finned induction device(FIG. 28A) was similar to the plasma produced using the helical copperload coil (FIG. 28B).

EXAMPLE 3

ICP-MS (Inductively coupled plasma-mass spectrometry) measurements wereperformed using numerous metal species, a conventional copper helicalinduction coil and a finned induction coil (referred to in FIG. 29 as a“Pine Cone Load Coil”). A plasma gas flow rate of 14 Liters/minute wasused with the finned induction device, whereas a plasma gas flow of 17liters/minute was used with the helical load coil. Measurements of ionswith the finned induction device were comparable to those obtained withthe helical load coil even though a lower amount of plasma argon gas wasbeing used with the finned induction device.

EXAMPLE 4

The finned, aluminum induction device was ran continuously for 1 hour(see FIG. 30A) and for 5 hours (FIG. 30B) to determine if any oxidationof the device or devitrification of the torch would be observed. Theplasma argon gas flow rate was 11 Liters/minute. No signs ofdevitrification of the torch were observed. The induction deviceremained shiny and did not exhibit any substantial oxidation after 5hours.

EXAMPLE 5

The mass spectrometry signal from various metal species (Ce, Be, CeO,In, Ce++ and U) was monitored over about an hour using the finnedaluminum induction device to determine stability. The plasma argon gasflow rate was 11 Liters/minute. As can be seen in the graph of FIG. 31(time shown in seconds), the signal was substantially constant for eachmetal species over a period of about 1 hour. From top to bottom of thegraph in FIG. 31, the order of the curves is In, Ce, U, Be, Ce++ and Ce.

When introducing elements of the examples disclosed herein, the articles“a,” “an,” “the” and “said” are intended to mean that there are one ormore of the elements. The terms “comprising,” “including” and “having”are intended to be open-ended and mean that there may be additionalelements other than the listed elements. It will be recognized by theperson of ordinary skill in the art, given the benefit of thisdisclosure, that various components of the examples can be interchangedor substituted with various components in other examples.

Although certain aspects, examples and embodiments have been describedabove, it will be recognized by the person of ordinary skill in the art,given the benefit of this disclosure, that additions, substitutions,modifications, and alterations of the disclosed illustrative aspects,examples and embodiments are possible.

1-20. (canceled)
 21. A system for sustaining an ionization source, thesystem comprising: a torch comprising a body comprising a longitudinalaxis along which a flow of gas is introduced during operation of thetorch; and a device comprising a base constructed and arranged as a coilcomprising a first coil turn and a second coil turn to provide an inneraperture formed from the first and second coil turns, in which the inneraperture is configured to receive a portion of the torch body, thedevice further comprising a first radial fin coupled to the first coilturn and a second radial fin coupled to the second coil turn, in whichthe device is configured to provide radio frequency energy to theportion of the torch body received by the inner aperture to sustain theionization source within the portion of the torch body.
 22. The systemof claim 21, in which the first radial fin is oriented non-parallel tothe longitudinal axis of the torch and extends away from the torch bodyin the aperture.
 23. The system of claim 22, in which the first radialfin is orthogonal to the longitudinal axis of the torch.
 24. The systemof claim 21, in which the position of the first radial fin on the baseis adjustable without decoupling the first radial fin from the base orremoving the portion of the torch body within the aperture.
 25. Thesystem of claim 24, in which the first radial fin couples to the basethrough a fastener.
 26. The system of claim 21, in which the firstradial fin is integrally coupled to the base.
 27. The system of claim22, further comprising a plurality of radial fins coupled to the base.28. The system of claim 27, in which at least two of the radial finscomprise the same angle.
 29. The system of claim 27, in which each ofthe plurality of radial fins is angled at substantially the same angleto the base when the base is not coiled.
 30. The system of claim 27, inwhich at least two of the plurality of radial fins are angled at adifferent angle to the base when the base is not coiled.
 31. The systemof claim 27, in which at least two of the plurality of radial fins havea different cross-sectional shape.
 32. The system of claim 21, in whichthe first radial fin comprises at least one aperture in the fin.
 33. Thesystem of claim 32, in which the aperture is configured as a throughhole that is positioned substantially parallel to the longitudinal axisof the torch.
 34. The system of claim 32, in which the fin aperture isangled toward the aperture formed by the base.
 35. The system of claim21, in which the device further comprises a plurality of radial finscoupled to the base, wherein at least two of the plurality of radialfins comprise an aperture in the fins, in which the apertures in the tworadial fins are constructed and arranged differently.
 36. The system ofclaim 21, in which the first radial fin is oriented non-parallel to thelongitudinal axis of the torch and extends inward within the apertureformed by the base.
 37. The system of claim 36, in which the firstradial fin is orthogonal to the longitudinal axis of the torch.
 38. Thesystem of claim 36, further comprising a plurality of radial finscoupled to the base, in which each of the plurality of radial fins isoriented non-parallel to the longitudinal axis of the torch and each ofthe plurality of fins extends inward within the aperture formed by thebase.
 39. The system of claim 36, further comprising a plurality ofradial fins coupled to the base, in which each of the plurality ofradial fins is oriented non-parallel to the longitudinal axis of thetorch and at least one radial fin extends inward within the apertureformed by the base.
 40. The system of claim 21, further comprising aplurality of radial fins coupled to the base, in which at least oneradial fin of the plurality of radial fins extends away from theaperture formed by the base and at least one radial fin of the pluralityof radial fins extends inward within the aperture formed by the base.41-263. (canceled)